Equipment & Facilities

Technology:

  • Thin film coating, vacuum evaporation, electron beam and sputtering
  • High power laser material processing
  • Microwave  Plasma  Enhanced  CVD system
  • Anodic oxidation
  • Diamond turning equipment for optical asphere generation
  • CNC controlled precision injection molding equipment
  • Electron beam litography
  • Workshops: optical (staff:1), optical coating (staff:1) crystal technology (staff:1), mechanical (staff: 2), electronic (staff:1)

Characterization and Measurement:

  • Surface profiling (Talysurf form test and Perthometer, optical profilometer)
  • Shack-Hartmann wavefront sensor
  • Optical microscopes
  • Scanning electron microscope (SEM)
  • Secondary Ion Mass Spectrometers (SIMS: sensitivity 0.01-1ppm, lateral resolution ~ 0.1 micrometer, depth resolution ~ 0.01 micrometer)
  • Scanning Auger Microprobe (SAM: sensitivity 1 %, lateral ~ 0,5 micrometer)
  • X-ray Photoelectron Spectroscope (XPS; sensitivity 0.1 %, energy resolution 0.80 eV)
  • UV-vis.-near IR spectrophotometer
  • Fizeau interferometer (optical shape and waveform)
  • C02 (20W, tunable), Ar ion, He-Ne, Nd-YAG and diode lasers
  • Visible and infrared detectors and detectors arrays (PSD, CCD)
  • Electric measuring facilities (3 GHz network analyzer, 12 GHz digitizing oscilloscope)
  • Impedance Spectorscopy
  • Precision optical positioners
  • Single mode fiber systems
  • Ellipsometry
  • Laser induced breakdown spectrometry

Self-developed systems:

  • Acousto-optical signal processing systems (spectrum analysers)
  • Differential absorption lidar
  • Photoacoustic and time-resolved fluorescence and NIR spectroscopes
  • Laser Doppler anemometer
  • NIR spectroscope (absorption & reflection systems)
  • Quadrupole mass spectrometers (QMS) for residual gas analysis
  • QMS coupled DC sensor tester
  • QMS plasma diagnostics with collisionless in situ sampling (IBMS)
  • Load lock system between deposition and analytic facility
  • Quadrupole ion trap for particle mass determination
  • Time of flight mass spectrometer
  • Photomodulated reflectometry
  • Femtosecond laser facility

CAD and Modelling:

  • Optical design and thin film softwares
  • CAD for electron and ion optics
  • CAD mechanical
  • Computer codes for atomistic quantum mechanical simulations
  • Artificial Neural Network models
  • Calculations are run in 6 supercomputer centers and on high end PCs (under linux, Windows XP, Windows 7)

Access Policy of Laboratory Equipments

© Design: István Molnár,
 coding: Dániel Sólyom (Diamondsoft Ltd)